Course 2: Modeling and Simulation of MOS Analog ICs Thursday - December 12 8:30-10:00 am An Overview of the SPICE FET Modeling Infrastructure Daniel Foty, Gilgamesh Associates A detailed review of the modeling of FET devices in SPICE. The evolution of FET models, from the original Level 1 model up through the most recent developments, such as BSIM3; sample results. Related issues, such as gate capacitance modeling, systematic process variations, and correlation with circuit results. Future trends in MOS modeling. 10:30-12:00 am Benchmarking FET Models for Circuit Design Daniel Foty, Gilgamesh Associates The behavior of several popular MOS models. Proactive tests which can be carried out on foundry MOS models before their use in circuit design. Methods for determining whether the model shortcomings are caused by structural deficiencies in the model formulation or by poor parameter extraction procedures. The difference between digital and analog design requirements. 1:30-5:00 pm SPICE: Its Use, Its Limitations and How to Overcome Them Michael Green, SUNY The numerical algorithms on which SPICE is based. The interaction of these algorithms with certain key fundamental aspects of circuits - e.g., circuit topology and device modeling. In-depth discussion of the following topics: dc operating point analysis issues, including convergence and stability; modeling; distortion analysis; transient analysis issues, including time-step errors and simulation near metastable states; issues regarding the simulation of RF circuits; alternatives to SPICE. Friday - December 13 8:30-12:00 am MOS Modeling Dedicated to Low-Voltage and Low-Current Circuit Design Christian Enz, EPFL The basic long-channel static model revisited: pinch-off voltage, modes of operation, current and transconductance in weak, moderate and strong inversion. Second-order effects: channel-length modulation, mobility reduction, velocity saturation, short- and narrow-channel effects, non-uniform doping. Quasi-static model: charges in weak and strong inversion. First-order non-quasi-static model. Noise model: thermal noise in weak and strong inversion, flicker (1/f) noise. Temperature effects. The EKV model: from hand calculation to computer simulation, pinch-off vs. gate voltage measurement, parameter extraction, experimental results. 1:30-5:00 pm Matching of MOS Transistors Marcel Pelgrom, Philips Research Labs Basic discussion of the factors affecting the matching properties of MOS transistors. The two key aspects: deterministic offsets and random offset. Random offset in the threshold voltage, in the current factor and in the substrate coefficient. The development over process generations and a comparison of different processes. The use of practical matching data in circuit design as illustrated by some examples. Saturday - December 14 8:30-12:00 am Interconnect Modeling Narain Arora, Simplex Solutions, Inc. An overview of interconnect issues in chip design; interconnect scaling laws, interconnect as a parasitic element, numerical and analytical methods of calculating lumped R, C and L of the interconnects. The verification and calibration of interconnect capacitance models; RC models for full chip extraction; the impact of process variations on the propagation delay due to interconnects. 1:30-5:00 pm Simulation of Substrate/Noise Coupling in Analog and Mixed-Signal ICs Nishath Verghese, Cadence Design Systems Overview of the various sources of noise and methods of coupling in ICs with emphasis on systematic noise coupling mechanisms from switching voltage and current through the substrate, interconnects and package. Discussion of substrate coupling and techniques for its analysis. Modeling the substrate using simple R(C) models. Modeling chip/package power distribution. Higher-level simulation and modeling of switching noise in large mixed-signal designs. Application of the modeling/simu- lation techniques to design and verification of industrial ICs.